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當(dāng)前位置：首頁(yè) > 產(chǎn)品中心 > 二維材料 > 六方氮化硼 > 基于285nm二氧化硅基底的單層氮化硼薄膜
簡(jiǎn)要描述：Single Layer CVD hexagonal Boron Nitride Film on 285 nm SiO2/Si substrates （p-doped）, 1cmx1cm: 4 packProperties of BN film97% coverage with minor holes and organic residuesHigh Crystalline Quality
產(chǎn)品型號(hào)： 廠商性質(zhì)：生產(chǎn)廠家更新時(shí)間：2025-05-07訪 問(wèn) 量：1474詳細(xì)介紹
Single Layer CVD hexagonal Boron Nitride Film on 285 nm SiO2/Si substrates (p-doped), 1cmx1cm: 4 pack
Properties of BN film
97% coverage with minor holes and organic residues
High Crystalline Quality
The Raman spectrum should peak at ~1369cm-1
Single Layer CVD hexagonal Boron Nitride Film on 285 nm SiO2/Si substrates (p-doped), 1cmx1cm: 4 pack
Properties of BN film
97% coverage with minor holes and organic residues
High Crystalline Quality
The Raman spectrum should peak at ~1369cm-1
Single Layer CVD hexagonal Boron Nitride Film on 285 nm SiO2/Si substrates (p-doped), 1cmx1cm: 4 pack
Properties of BN film
97% coverage with minor holes and organic residues
High Crystalline Quality
The Raman spectrum should peak at ~1369cm-1
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